[B-12-2] A Reliable Interconnection Technology Using Organic Low-K Dielectrics for 0.18 μm CMOS Circuit

Kazuhiko Tokunaga, Koichi Ikeda, Takaaki Miyamoto, Toshiaki Hasegawa, Masanaga Fukasawa, Hideyuki Kito, Shingo Kadomura (1.Process Development Dept.2, LSI Business & Technology Development Group, C.N.C., Sony Corporation)

https://doi.org/10.7567/SSDM.1999.B-12-2