[B-13-2] Measurement of Copper Drift in Methylsilsesquioxane Dielectric Films

Seiji Mukaigawa, Takamaro Kikkawa, Tomoko Aoki, Yasuo Shimizu (1.Research Center for Nanodevices and Systems, Hiroshima University, 2.Tonen Corporation)

https://doi.org/10.7567/SSDM.1999.B-13-2