[B-13-3] New Low k Material "LKD TM" for Al Damascene Process Application

R. Nakata、M. Kawai、N. Yamada、H. Miyajima、K. Higashi、H. Ichinose、S. Seta、Y. Matsui、G. Minamihaba、N. Matsunaga、N. Hayasaka (1.ULSI Process Engineering Laboratory, TOSHIBA CORPORATION)

https://doi.org/10.7567/SSDM.1999.B-13-3