[B-15-2] Boron Penetration Enhanced by Gate Ion Implantation Damage in PMOSFETs

Takayuki Aoyama, Kunihiro Suzuki, Hiroko Tashiro, Yoko Tada, Hiroshi Arimoto (1.Fujitsu Laboratories Ltd.)

https://doi.org/10.7567/SSDM.1999.B-15-2