[B-15-2] Boron Penetration Enhanced by Gate Ion Implantation Damage in PMOSFETs

Takayuki Aoyama、Kunihiro Suzuki、Hiroko Tashiro、Yoko Tada、Hiroshi Arimoto (1.Fujitsu Laboratories Ltd.)

https://doi.org/10.7567/SSDM.1999.B-15-2