[B-2-3] Study of an Elevated Drain Fabrication Method for Ultra Shallow Junction

M. Nakano、H. Kotaki、K. Sugimoto、T. Okumine、F. Yoshioka、S. Kakimoto、K. Ohta、N. Hashizume (1.Advanced Technology Research Laboratories, Sharp Corporation)

https://doi.org/10.7567/SSDM.1999.B-2-3