[B-3-2] High-Integrity Silicon Oxide Grown at Low-Temperature by Atomic Oxygen Generated in High-Density Krypton Plasma

Yuji Saito, Katsuyuki Sekine, Masaki Hiramaya, Tadahiro Ohmi (1.Department of Electronic Engineering, Graduate School of Engineering, Tohoku University, 2.New Industry Creation Hatchery Center, Tohoku University)

https://doi.org/10.7567/SSDM.1999.B-3-2