Excess Noise Characteristics of a-Si:H Avalanche Photodiode Films Using Functionally Graded Structure

Kazuaki Sawada; Masahiro Akiyama; Hidekuni Takao; Makoto Ishida

doi:https://doi.org/10.7567/SSDM.1999.E-7-5

1999 International Conference on Solid State Devices and Materials

1999年9月21日〜 1999年9月24日
Nihon Toshi Center Kaikan, Tokyo, Japan

[E-7-5] Excess Noise Characteristics of a-Si:H Avalanche Photodiode Films Using Functionally Graded Structure

Kazuaki Sawada、Masahiro Akiyama、Hidekuni Takao、Makoto Ishida (1.Department of Electrical and Electronic Engineering, Toyohashi University of Technology)

https://doi.org/10.7567/SSDM.1999.E-7-5

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