[A-3-4] Effects of Step Coverage, Cl Content and Deposition Temperature in TiN Top Electrode on the Reliability of Ta2O5 and Al2O3 MIS Capacitor for 0.13 μm Technology and Beyond

Hyun Seok Lim、Sang Bom Kang、In Sang Jeon、Gil Heyun Choi、Young Wook Park、Sang In Lee、Joo Tae Moon (1.Process Development 2, Semiconductor R&D Center, Samsung Electronics)

https://doi.org/10.7567/SSDM.2000.A-3-4