[A-5-6] Dual-Thickness Gate Oxidation Technology with Halogen/Xenon Implantation for Embedded DRAMs

Taro Sugizaki、Atsushi Murakoshi、Yoshio Ozawa、Toshiro Nakanishi、Kyoichi Suguro (1.Fujitsu Laboratories Ltd.、2.Toshiba Corporation)

https://doi.org/10.7567/SSDM.2000.A-5-6