[A-5-6] Dual-Thickness Gate Oxidation Technology with Halogen/Xenon Implantation for Embedded DRAMs

Taro Sugizaki, Atsushi Murakoshi, Yoshio Ozawa, Toshiro Nakanishi, Kyoichi Suguro (1.Fujitsu Laboratories Ltd., 2.Toshiba Corporation)

https://doi.org/10.7567/SSDM.2000.A-5-6