[A-5-7] Impacts of Chlorine in CVD-TiN Gate Electrode on the Gate Oxide Reliability in Multiple-Thickness Oxide Technology

Masaru Moriwaki、Takayuki Yamada (1.ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electronics Corp.)

https://doi.org/10.7567/SSDM.2000.A-5-7