[A-7-6] The Formation of High Temperature Stable Co-Silicide from Co1-xTax/Si Systems

Deok-Hyung Lee, Dae-Hong Ko, Hyo-Jick Choi, Ja-Hum Ku, Siyoung Choi, Kazuyuki Fujihara, Ho-Kyu Kang Sang-Ho Oh, Chan-Gyung Park, Hoo-Jeung Lee (1.Department of Ceramic Engineering, Yonsei University, 2.Process Development Team Semiconductor R&D Division Samsung Electronics Co., 3.Pohang University of Science and Technology (POSTECH), 4.Stanford University)

https://doi.org/10.7567/SSDM.2000.A-7-6