The Japan Society of Applied Physics

[B-1-3] The Impact for Gate Oxide Scaling (32A-12A) and Power Supply for Sub-0.1 μm CMOSFETs

W. K. Yeh, C. Y. Lin, S. M. Cheng, C. T. Huang, H. H. Shih, J. K. Chen, F. T. Liou (1.United Microelectronics Corp., Logic Technology Department, Technology & Process Development Division)

https://doi.org/10.7567/SSDM.2000.B-1-3