[B-1-5] High Density 0.16 μm Embedded-DRAM-ASIC Process Technology for a SoC Platform

J. Ida, H. Tanaka, K. Fukuda, M. Takeda, H. Shinohara, N. Nakayama, E. Seo, K. Yoshida, H. Higashino, Y. Miyakawa, M. Kageyama, Y. Harada, M. Matsumoto, T. Inoue, F. Yokoyama (1.LSI Production Division, VLSI R&D Center, LSI Division, OKI Electric Industry Co., Ltd.)

https://doi.org/10.7567/SSDM.2000.B-1-5