[B-5-4] Chemical Bonding at Interfaces between Si (100) and High-K Dielectrics: Competing Effects of i) Process Gas-Substrate and ii) Film Deposition Reactions

Gerald Lucovsky、Hiro Niimi、Robert Johnson、Joon Goo Hong、Robert Therrien、Bruce Rayner (1.Departments of Physics, Materials Science and Engineering, and Electrical and Computer Engineering, North Carolina State University)

https://doi.org/10.7567/SSDM.2000.B-5-4