[B-5-5] Degradation of Ta2O5 Gate Dielectric by TiCl4-Based Chemically Vapor Deposited TiN Film in W/TiN/Ta2O5/Si System

Joo Wan Lee, Chang Hee Han, Ji-Soo Park, Jin Won Park (1.Memory R&D Division, Hyundai Electronics Industries Co., Ltd.)

https://doi.org/10.7567/SSDM.2000.B-5-5