[B-5-6] High Quality Ultrathin TaOxNy Gate Dielectric Prepared by Nitridation of Ta2O5

Hyungsuk Jung, Kiju Im, Sanghun Jeon, Dooyoung Yang, Hyunsang Hwang (1.Dept. of Materials Sci. & Eng., Kwangju Institute of Science and Technology, 2.Jusung Engineering)

https://doi.org/10.7567/SSDM.2000.B-5-6