[B-5-7] TaOxNy Gate Dielectric with Improved Thermal Stability

Heung-Jae Cho, Dae-Gyu Park, In-Seok Yeo, Jae-Sung Roh, Jeong-Mo Hwang (1.Advanced Process Team, Memory R&D Division, Hyundai Electronics Industries Co. Ltd.)

https://doi.org/10.7567/SSDM.2000.B-5-7