[B-9-5] Low Resistivity PVD TaNx/Ta/TaNx Stacked Metal Gate CMOS Technology Using Self-Grown bcc-Phased Tantalum on TaNx Buffer Layer

Hiroyuki Shimada, Ichiro Ohshima, Takeo Ushiki, Shigetoshi Sugawa, Tadahiro Ohmi (1.Department of Electronic Engineering, Graduate School of Engineering, Tohoku University, 2.New Device Development Group, SEIKO EPSON Corporation, 3.New Industry Creation Hatchery Center, Tohoku University)

https://doi.org/10.7567/SSDM.2000.B-9-5