Reduced Reverse Narrow Channel Effect in Thin SOI nMOSFET&apos;s

S. J. Chang; C. Y. Chang; S. D. Wu; T. Y. Huang; T. S. Chao

doi:https://doi.org/10.7567/SSDM.2000.C-8-6

2000 International Conference on Solid State Devices and Materials

2000年8月29日〜 2000年8月31日
Sendai International Center, Sendai, Japan

[C-8-6] Reduced Reverse Narrow Channel Effect in Thin SOI nMOSFET's

S. J. Chang、C. Y. Chang、S. D. Wu、T. Y. Huang、T. S. Chao (1.Department of Electronics Engineering, National Chiao Tung University、2.National Nano Device Labs.)

https://doi.org/10.7567/SSDM.2000.C-8-6

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