[A-1-5] CMP Using Fixed Abrasive Tool (FX-CMP) for Dielectric Planarization

S. Katagiri, K. Yasui, Y. Kawamura, U. Yamaguchi, M. Nagasawa, F. Kanai, R. Kawai, M. Tokuda, S. Moriyama, N. Yamada (1.Central Research Laboratory, Hitachi, Ltd., 2.Semiconductor & Integrated circuits, Hitachi, Ltd., 3.Manufacturing Engineering & Environmental Policy Department, Hitachi, Ltd., 4.Instruments, Hitachi, Ltd., 5.Institute of Technologists, 6.Nihon Tokushu Kento co., Ltd.)

https://doi.org/10.7567/SSDM.2001.A-1-5