[A-2-5] Effect of Poly Metal Gate Etch Post-Cleaning on the Tail Distribution of DRAM Data Retention Time
Nam-Sung Kim, Il-Gweon Kim, Jun-Ho Choy, Se-Kyeong Choi, Jo-Bong Choi, Young-Woo Kweon, Sung-Cheul Kim, Ju-Seok Park, Ji-Bum Kim
(1.Technology Group 4, Memory R&D Division, Hynix Semiconductor Co., Ltd.)
https://doi.org/10.7567/SSDM.2001.A-2-5