[A-4-5] A Study on the Germano-Silicide Formation in the Ni/Si1-xGex System for CMOS Device Applications

Hyo-Jick Choi, Dae-Hong Ko, Ja-Hum Ku, Chul-Joon Choi, Siyoung Choi, Kazuyuki Fujihara, Ho-Kyu Kang Cheol-Woong Yang (1.Department of Ceramic Engineering, Yonsei University, 2.Process Development Team Semiconductor R&D Division Samsung Electronics Co., 3.School of Metallurgical and Materials Engineering, Sungkyunkwan University)

https://doi.org/10.7567/SSDM.2001.A-4-5