[B-10-3] Characterization of Oxygen Vacancies in SrTiO3 Thin Films by Auger Electron Spectroscopy and Its Application to Leakage Current Reduction of Ru/SrTiO3/Ru Capacitor

S. Niwa、S. Yamazaki、M. Kiyotoshi、J. Nakahira、M. Nakabayashi、C. M. Chu、K. Eguchi (1.Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation、2.ULSI Technology Development Division, Fujitsu Limited、3.DRAM Process Integration and Module Technology Department, Winbond Electronics Corporation)

https://doi.org/10.7567/SSDM.2001.B-10-3