The Japan Society of Applied Physics

[B-4-1] Enhanced Negative-Bias-Temperature Instability of P-Channel MOSFET by Plasma Charging Damage

Da-Yuan Lee、Horng-Chih. Lin、Meng-Feng Wang、Min-Yu Tsai、Tiao-Yuan Huang、Tahui Wang (1.Institute of Electronics, National Chiao Tung University、2.National Nano Device Laboratories)

https://doi.org/10.7567/SSDM.2001.B-4-1