The Japan Society of Applied Physics

[B-4-1] Enhanced Negative-Bias-Temperature Instability of P-Channel MOSFET by Plasma Charging Damage

Da-Yuan Lee, Horng-Chih. Lin, Meng-Feng Wang, Min-Yu Tsai, Tiao-Yuan Huang, Tahui Wang (1.Institute of Electronics, National Chiao Tung University, 2.National Nano Device Laboratories)

https://doi.org/10.7567/SSDM.2001.B-4-1