[B-4-3] Post-Soft-Breakdown Characteristics of Deep Sub-Micron NMOSFETs with Ultra-Thin Gate Oxide
Da-Yuan Lee, Horng-Chih Lin, Min-Yu Tsai, Tiao-Yuan Huang, T. Wang
(1.Institute of Electronics, National Chiao Tung University, 2.National Nano Device Laboratories)
https://doi.org/10.7567/SSDM.2001.B-4-3
