[B-4-3] Post-Soft-Breakdown Characteristics of Deep Sub-Micron NMOSFETs with Ultra-Thin Gate Oxide
Da-Yuan Lee、Horng-Chih Lin、Min-Yu Tsai、Tiao-Yuan Huang、T. Wang
(1.Institute of Electronics, National Chiao Tung University、2.National Nano Device Laboratories)
https://doi.org/10.7567/SSDM.2001.B-4-3