[B-6-2] Atomic-Scale Depth Profiling of Oxides/Si(111) and Oxynitrides/Si(100) Interface
Tomohiro Nakamura, Kyoko Nishizaki, Keisuke Takahashi, Hiroshi Nohira, Takeo Hattori
(1.Department of Electrical and Electronic Engineering, Musashi Institute of Technology)
https://doi.org/10.7567/SSDM.2001.B-6-2