[B-9-3] Scanning Tunneling Microscopy Study of Hf Silicate Formed by Ulttrathin Hf Metal on SiO2:Effect of Hf/SiO2 Thickness Ratio
Jung-Ho Lee、Masakazu Ichikawa
(1.Joint Research Center for Atom Technology, AIST)
https://doi.org/10.7567/SSDM.2001.B-9-3