[B-9-4] PVD Tantalum Oxide with Buffer Silicon Nitride Stacked High-k MIS Structure Using Low Temperature and High Density Plasma Processing
Shin-Ichi Nakao、Munekatsu Nakagawa、Ichiro Ohshima、Hiroyuki Shimada、Tadahiro Ohmi
(1.Department of Electronic Engineering, Graduate School of Engineering, Tohoku University、2.New Industry Creation Hatchery Center, Tohoku University)
https://doi.org/10.7567/SSDM.2001.B-9-4