[B-9-5] Suppressed Boron Penetration in p+ poly-Si/Al2O3/Si Metal-Oxide-Semiconductor System by Remote Plasma Nitridation of Al2O3 Surface

Heung-Jae Cho、Dae-Gyu Park、Kwan-Yong Lim、Jung-Kyu Ko、In-Seok Yeo、Jin Won Park、Hee-Koo Yoon (1.Advanced Process Team, Memory R&D Division, Hyundai Electronics Industries Co. Ltd.)

https://doi.org/10.7567/SSDM.2001.B-9-5