[C-3-3] Novel Fabrication Technique for Relaxed SiGe-on-Insulator Substrates without Thick SiGe Buffer Structures

Tomohisa Mizuno, Naoharu Sugiyama, Tsutomu Tezuka, Shin-ichi Takagi (1.Advanced LSI Technology Laboratory, Corporate R&D Center, Toshiba Corporation)

https://doi.org/10.7567/SSDM.2001.C-3-3