[C-3-4] Thinner SOI Using Plasma Hydrogenation

A. Y. Usenko、A. G. Ulyashin、W. N. Carr、W. R. Fahrner、A. V. Frantskevich、R. Job (1.Silicon Wafer Technologies Inc.、2.Hagen University、3.Belarussian State Polytechnic Academy、4.New Jersey Institute of Technology)

https://doi.org/10.7567/SSDM.2001.C-3-4