[C-6-1] Scenario of Source/Drain Extension and Halo Engineering for High Performance 50 nm SOI-pMOSFET
Naoto Horiguchi, Yukio Tagawa, Tomonari Yamamoto, Manabu Kojima, Toshihiro Sugii
(1.Fujitsu Laboratories Ltd.)
https://doi.org/10.7567/SSDM.2001.C-6-1
