[C-6-1] Scenario of Source/Drain Extension and Halo Engineering for High Performance 50 nm SOI-pMOSFET Naoto Horiguchi、Yukio Tagawa、Tomonari Yamamoto、Manabu Kojima、Toshihiro Sugii (1.Fujitsu Laboratories Ltd.) https://doi.org/10.7567/SSDM.2001.C-6-1