[F-1-1] Carrier Transport of SiN Gate Dielectrics for Dual-Gate CMOSFETs
Hironobu Fukui、Mariko Takayanagi、Shinji Mori、Takashi Shimizu、Yoshiaki Toyoshima
(1.System LSI Research & Development Center, Process & Manufacturing Engineering Center Toshiba Corporation Semiconductor Company)
https://doi.org/10.7567/SSDM.2001.F-1-1