[P-1-8] Low Temperature BST-CVD Process for the Concave-Type Capacitors Designed for Logic-Base-Embedded DRAMs

Akihiko Tsuzumitani, Yasutoshi Okuno, Hisashi Ogawa, Yoshihiro Mori, Charles N. Dornfest, Xiaoliang Jin, Shreyas Kher, Jerry Tao, Yaxin Wang, Jun Zhao (1.ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd., 2.Applied Materials)

https://doi.org/10.7567/SSDM.2001.P-1-8