[P-1-8] Low Temperature BST-CVD Process for the Concave-Type Capacitors Designed for Logic-Base-Embedded DRAMs

Akihiko Tsuzumitani、Yasutoshi Okuno、Hisashi Ogawa、Yoshihiro Mori、Charles N. Dornfest、Xiaoliang Jin、Shreyas Kher、Jerry Tao、Yaxin Wang、Jun Zhao (1.ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd.、2.Applied Materials)

https://doi.org/10.7567/SSDM.2001.P-1-8