[A-6-2] A Novel Structure of SiO2/SiN/High k Dielectrics, Al2O3 for SONOS Type Flash Memory

Changhyun Lee、Sunghoi Hur、Youcheol Shin、Jeonghyuk Choi、Donggun Park、Kinam Kim (1.Advanced Technology Development Team, Semiconductor R&D Center, Memory Business, Samsung Electronics Co., Ltd.)

https://doi.org/10.7567/SSDM.2002.A-6-2