The Japan Society of Applied Physics

[A-6-2] A Novel Structure of SiO2/SiN/High k Dielectrics, Al2O3 for SONOS Type Flash Memory

Changhyun Lee, Sunghoi Hur, Youcheol Shin, Jeonghyuk Choi, Donggun Park, Kinam Kim (1.Advanced Technology Development Team, Semiconductor R&D Center, Memory Business, Samsung Electronics Co., Ltd.)

https://doi.org/10.7567/SSDM.2002.A-6-2