[A-8-1] Voltage Acceleration of Ultra-Thin Gate Oxide Degradation before and after Soft Breakdown

Takuji Hosoi、Shigeyasu Uno、Yoshinari Kamakura、Kenji Taniguchi (1.Dept. of Electronics and Information Systems, Graduate School of Eng., Osaka Univ.)

https://doi.org/10.7567/SSDM.2002.A-8-1