[A-9-1] Mobility Reduction due to Remote Charge Scattering in Al2O3/SiO2 Gate-Stacked MISFETs

Shin-ichi Saito、Yasuhiro Shimamoto、Kazuyoshi Torii、Yukiko Manabe、Matty Caymax、Jan Willem Maes、Masahiko Hiratani、Shin'ichiro Kimura (1.Central Research Laboratory, Hitachi, Ltd.、2.IMEC、3.ASM International NV)

https://doi.org/10.7567/SSDM.2002.A-9-1