[A-9-1] Mobility Reduction due to Remote Charge Scattering in Al2O3/SiO2 Gate-Stacked MISFETs

Shin-ichi Saito, Yasuhiro Shimamoto, Kazuyoshi Torii, Yukiko Manabe, Matty Caymax, Jan Willem Maes, Masahiko Hiratani, Shin'ichiro Kimura (1.Central Research Laboratory, Hitachi, Ltd., 2.IMEC, 3.ASM International NV)

https://doi.org/10.7567/SSDM.2002.A-9-1