[A-9-3] SiO2/Si Suboxide Characteristics of Ultra-Thin Gate Oxides Prepared by Room Temperature Anodic Oxidation and Rapid Thermal Oxidation
Yen-Po Lin, Zhi-Hao Chen, Jenn-Gwo Hwu
(1.Room 446, Department of Electrical Engineering/Graduate Institute of Electronics Engineering, National Taiwan University)
https://doi.org/10.7567/SSDM.2002.A-9-3
