[B-1-4] Impact of Hf metal pre-deposition in CVD- and PVD-HfO2 dielectrics

Kazuhiko Yamamoto, Masayuki Asai, Shigenori Hayashi, Sadayoshi Horii, Masaaki Niwa, Hironobu Miya (1.ULSI Process Technology Development Center, Matsushita Electric Industrial Co., Ltd., 2.Semiconductor equipment system laboratory, Hitachi Kokusai Electric Inc.)

https://doi.org/10.7567/SSDM.2002.B-1-4