[B-1-4] Impact of Hf metal pre-deposition in CVD- and PVD-HfO2 dielectrics

Kazuhiko Yamamoto、Masayuki Asai、Shigenori Hayashi、Sadayoshi Horii、Masaaki Niwa、Hironobu Miya (1.ULSI Process Technology Development Center, Matsushita Electric Industrial Co., Ltd.、2.Semiconductor equipment system laboratory, Hitachi Kokusai Electric Inc.)

https://doi.org/10.7567/SSDM.2002.B-1-4