Integrated High-k and Metal Gate Processing Using RTP and ALCVD TM

C. Werkhoven; H. de Waard; E. Shero; C. Pomarede; S. Marcus; J. W. Maes; Z. M. Rittersma; M. A. Verheijen

doi:https://doi.org/10.7567/SSDM.2002.B-3-1

2002 International Conference on Solid State Devices and Materials

2002年9月17日〜 2002年9月19日
Nagoya Congress Center, Nagoya, Japan

[B-3-1] Integrated High-k and Metal Gate Processing Using RTP and ALCVD TM

C. Werkhoven、H. de Waard、E. Shero、C. Pomarede、S. Marcus、J. W. Maes、Z. M. Rittersma、M. A. Verheijen (1.ASM America, Inc.、2.ASM Belgium N. V.、3.Philips Research Leuven)

https://doi.org/10.7567/SSDM.2002.B-3-1

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