Integrated High-k and Metal Gate Processing Using RTP and ALCVD TM

C. Werkhoven; H. de Waard; E. Shero; C. Pomarede; S. Marcus; J. W. Maes; Z. M. Rittersma; M. A. Verheijen

doi:https://doi.org/10.7567/SSDM.2002.B-3-1

2002 International Conference on Solid State Devices and Materials

Sep 17, 2002 - Sep 19, 2002
Nagoya Congress Center, Nagoya, Japan

[B-3-1] Integrated High-k and Metal Gate Processing Using RTP and ALCVD TM

C. Werkhoven, H. de Waard, E. Shero, C. Pomarede, S. Marcus, J. W. Maes, Z. M. Rittersma, M. A. Verheijen (1.ASM America, Inc., 2.ASM Belgium N. V., 3.Philips Research Leuven)

https://doi.org/10.7567/SSDM.2002.B-3-1

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